"A mathematical simulation of implantation processes of doping
donor and acceptor impurities in a silicon wafer"
A computational method for the mathematical simulation of one of the main technological processes in the nanostructured semiconductor material fabrication is briefly described. Some numerical results obtained with variation of constitutive parameters are analyzed. Several problems of mathematical simulation related to a size decrease of nanoelectromechanical systems are discussed.
Keywords: mathematical simulation, doping in silicon, implantation, donor and acceptor impurities
|Tarnavsky G.A. e-mail: firstname.lastname@example.org|